Extreme Ultraviolet and Beyond Extreme Ultraviolet Lithography using Amorphous Zeolitic Imidazolate Resists Deposited by Atomic/Molecular Layer Deposition

K. E Waltz, X. Zhou, X. Krull, S. Singh, E. Mattson, Y. Miao, M. Hettermann, T. Grodt, Q. Zhang, H. Im, B. Lüttgenau, L. Doyle, A. Kraetz, M. Beutner, S. B. Clendenning, D. H. Fairbrother, J. T. Hupp, P. Naulleau, L. Rooney, O. Kostko, and M. Tsapatsis, Extreme Ultraviolet and Beyond Extreme Ultraviolet Lithography using Amorphous Zeolitic Imidazolate Resists Deposited by Atomic/Molecular Layer Deposition, ChemRxiv, 2025. DOI: 10.26434/chemrxiv-2025-s1n4s